Widely used in
Aerospace: Key sealing materials
Chip manufacturing: sealing structural components at various key nodes throughout the entire semiconductor manufacturing process
Petrochemical industry: critical seals
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Perfluoroether rubber (FFKM) is a high-performance specialty elastomer material composed of perfluorinated vinyl ether copolymers. As one of the elastomer materials with the highest chemical stability, FFKM maintains excellent physical properties and chemical stability even in extreme environments, making it an ideal sealing material for high-end fields such as aerospace, semiconductor manufacturing, and petrochemical equipment;
1. Excellent chemical stability The molecular structure of FFKM contains no C-H bonds and is entirely composed of C-F bonds, making it highly resistant to almost all chemicals. The product can withstand the erosion of more than 1,600 chemicals, including strong acids, strong alkalis, organic solvents, oxidants, etc;
2. Wide operating temperature range Minimum operating temperature: -25℃ Maximum operating temperature: 327℃ It can maintain good elasticity and sealing performance even under extreme temperature conditions;
3. Excellent high temperature resistance It remains undeformed and unhardened after long-term use at a high temperature of 300℃, and can withstand an extreme temperature of 327℃ for a short period of time;
4. Low gas permeability With a tightly packed molecular structure, it exhibits extremely low permeability to gases and vapors, making it particularly suitable for applications requiring vacuum and high purity.
| Number | Basic Description | Performance Characteristics | benchmark product | Recommended applications for rubber compound grades | Application Suggestions |
| LANSYN-SC | Perfluoro-peroxy-excellent chemical resistance | Excellent chemical resistance -230°C | Solvay 06HC | SC513, E38, W240, G570 | Chemical engineering applications, constant humidity semiconductor wet processes, and mature vacuum process applications |
| LANSYN-HC | Perfluoro-peroxy-high strength and chemical resistance | High strength and chemical resistance - 230°C | AGC 3500 | 8002 | High strength without filler, ultra-high cleanliness |
| LANSYN-CT | Perfluoro-peroxy-high temperature conventional aging resistance | High temperature conventional aging resistance -280°C | Solvay 95HT | G100XT | Compatible with certain resistance to aging and heat resistance |
| LANSYN-CP | Perfluoro-peroxy-high temperature resistant-premixed PTFE | High temperature plasma resistance -280°C | Solvay 5910M, 5920M | G67P, G74P | Compatible with aging resistance and plasma resistance, suitable for semiconductor ETCH and other processes |
| LANSYN-T | Perfluoro-triazine - Conventional heat resistance | Conventional heat resistance -300°C | Solvay 1055B | XPE, 351 | Broad-spectrum heat-resistant material, compatible with various fillers, suitable for semiconductor CVD, ETCH, DIFF, etc |
| LANSYN-ST | Perfluoro-triazine - excellent heat resistance | Excellent heat resistance -325°C | Solvay 2160B | 8900, 551 | Semiconductor manufacturing processes such as DIFF are preferred |
| LANSYN-HT | Perfluoro-triazine - High-strength heat resistance | High strength heat resistance -300°C | AGC 5500 | XRZ | High strength without fillers, ultra-high cleanliness |
| LANSYN-TP | Perfluoro-triazine-conventional heat-resistant-premixed PTFE | Heat-resistant and plasma-resistant - 300°C | Solvay 1065O, 1075O | 9100, 9500 | Compatible with both heat resistance and plasma resistance, preferred for semiconductor CVD and ETCH |